Used PERKIN ELMER 2400 #42887 for sale

Manufacturer
PERKIN ELMER
Model
2400
ID: 42887
Wafer Size: 6"
Sputtering system, 6" Sputters down (3) Diameter RF targets for metals / Dielectrics, 8" Ion / Dual TC gauge DC Power supply (2) RF Power supplies (8) CTI Cryopumps CTI 8 Cryopump with compressor ENI OEM 12B RF Power supply, 12 kW MATT VAC 5 kW DC Supply with pulse option Soft etcher LEYBOLD D30A Dual stage mechanical pump Direct drive mechanical pump With spinning ring holds up to wafer 6" DC Power supply.
PERKIN ELMER 2400 is a sputtering equipment which combines advanced sputtering equipment with an intuitive user interface. The system uses a combination of direct current (DC) and radio frequency (RF) sources to deposit layers of conductive and insulating material onto a substrate. By varying the amount and type of material being sputtered and the target environment, various film types can be produced on different substrates such as glass, SiO2, GaP, and diamond. 2400 features a high-power, close-coupled magnetron sputtering source for depositing highly uniform layers with excellent adhesion. The source has an independent sputter source and anvil gun on a mechanically adjustable base, allowing the optimum angle of source-to-substrate transfer. The anvil gun allows for the precise delivery of sputtered material, with uniformity across the substrate and feature sizes as small as 8 microns achievable. PERKIN ELMER 2400 uses a high-precision robotic stage for substrate manipulation. This lets users accurately move and position their substrate, as well as adjust the angle and distance of the substrate from the source. This ensures the highest quality coating is achieved, while also reducing the time taken to coat a substrate. 2400 is extremely easy to use. Its user-friendly graphical user interface (GUI) provides a convenient way to control the unit parameters, as well as offering automatic recipe creation and management. The machine is also equipped with a variety of vacuum gauges and monitors which can measure the chamber pressure and monitor process conditions. Overall, PERKIN ELMER 2400 is a powerful sputtering tool which can be used for a variety of applications. It is equipped with an advanced sputtering source and an intuitive user interface, which enables users to quickly and reliably deposit layers of conductive and insulating material onto their substrates with exact control. Additionally, the asset features a high-precision robotic stage for precise substrate positioning, as well as a range of vacuum gauges and monitors for continuous process monitoring.
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