Used PERKIN ELMER 2400 #9140537 for sale

PERKIN ELMER 2400
Manufacturer
PERKIN ELMER
Model
2400
ID: 9140537
Sputtering system.
PERKIN ELMER 2400 is a sputtering equipment used primarily in the field of materials science. It is a powerful, versatile and affordable tool for depositing thin films onto a substrate. The system comprises a compact housing containing a multi-target sputter source, a vacuum chamber, a cryogenically-cooled substrate stage, a variable pressure gas box and a sputter gas box. The vacuum chamber offers a range of pressure levels and up to six pulsed deposition sources. The cryogenically-cooled substrate stage can accommodate substrates ranging in size from 75x75mm to 200x200mm. The sputtering process begins with the Evacuation/Outgassing phase. This involves pumping down the chamber to a pressure of around 10-4 Torr for deposition. Then the substrate is heated up to the desired temperature using a resistive heat stage and the sputter gas mixture is delivered to the sputter source via the gas box. This gas is pulsed into the chamber using a series of fast DC pulses. These pulses create high energy particles that will be used to perform sputter deposition. Finally, the targets in the unit are implanted with inert gas, ionized and bombarded with a voltage of up to 10 Killovolts. This bombardment creates a shower of energetic particles, which sputter material off the target and deposit it onto the substrate surface. The sputtered material typically stops within several microns of the surface but can be tailored depending on the application. 2400 can deposit a variety of thin films including nitrides, oxides, carbides, metal alloys and dielectric films. All sputtering is executed under a controlled environment where the process parameters are constant, enabling precise control of film thickness and composition. This machine is also compatible with in situ and ex situ analysis techniques, including various forms of electron spectroscopy and microscopy. PERKIN ELMER 2400 is an ideal tool for the deposition of thin films in research facilities as it offers precise control and a wide range of compatibility. This advanced sputtering asset is easy to operate, reliable and cost effective, making it an ideal choice for anyone looking for a quality sputtering model.
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