Used PERKIN ELMER 2400 #9269416 for sale

PERKIN ELMER 2400
Manufacturer
PERKIN ELMER
Model
2400
ID: 9269416
Wafer Size: 4"-6"
Sputtering system, 4"-6".
PERKIN ELMER 2400 is a sputtering equipment designed for research and manufacturing applications. It is one of the most advanced sputtering systems on the market, offering exceptional performance and fast throughput. The system is based on magnetron-type, direct-current (DC) sputtering technology, with a range of target shapes and sizes. It features a novel gas-substrate control unit to allow precise control of gas flow, pressure, and temperature. This machine helps to ensure uniformity of films across the entire substrate, as well as consistent properties and performance from run to run. The tool is highly versatile and can be applied to a variety of technologies, including semiconductor, flat panel display, optical, solar energy, photo-voltaic cell, and nanotechnology. It also supports various particulate deposition and coating processes, such as electroplating, galvanizing, and vacuum-metallizing. The asset has a temperature range between -20° and +85° Celsius and includes an autoregulated power supply unit, which can be adjusted to achieve various process requirements. The model also features a low-vacuum chamber that can be used for various processes, such as sputtering, cleaning, physical vapor deposition (PVD), and optically active hydrogen termination. The equipment is designed to offer reliable and consistent results across a variety of processes, yielding high accuracy and repeatability. It is easy to operate and offers a range of features, such as adjustable process parameters, automated substrate loading, and automated unloading. 2400 offers high process control and repeatability, with a range of accessories and options to suit any application. Its modular design is easy to operate, and the system can be configured to accommodate several substrates at once. Additionally, the unit offers a customizable platform with the ability to control parameters and save processes for future use. Finally, the machine has excellent pulse power performance with stable voltage, consistent current, and lower pulse-width.
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