Used PERKIN ELMER 3300 ICP XL #164671 for sale

PERKIN ELMER 3300 ICP XL is a sputter deposition equipment that uses an inductively coupled plasma (ICP) as an ion source for surface sputter coating. The system is composed of an individual deposition chamber, a vacuum chamber, a magnetron power supply, an RF power supply, and an ICP power supply. The unit operates using a sputter deposition process in which an atomized material is clustered into the surface of a substrate. This process involves an interior chamber in which a high-power radio frequency wave is generated. The sputtering material is then subjected to an intense electric field with the help of a magnetron, which ionizes the material before being deposited on the surface of the substrate. This process is known as ion plating and is often used in the semiconductor field as a way to protect delicate components from oxidation and contamination. 3300 ICP XL sputter machine is composed of an individual deposition chamber and a vacuum chamber, both of which are connected to the ICP source. The ICP source generates a plasma which is used to provide a highly-charged atmosphere and create a powerful electric field within the deposition chamber. This field is necessary in order to extract material from the target and into the substrate. The ionized material is then accelerated towards the substrate in order to create a thin, uniform film on its surface. This deposition process can be utilized for a variety of materials, including metals, ceramics, and polymers. As for deposit parameters, PERKIN ELMER 3300 ICP XL is equipped with a wide range of features. Its magnetron power supply is capable of outputting up to 500 watts, with the RF power supply able to generate up to 200 watts of RF power. Additionally, the tool can be operated at pressures ranging from 1 mT to 10 mT, with a deposition rate of up to 0.13nm/second. Finally, the asset comes with an intuitive graphical user interface that allows for fine-grained control over the deposition and sputtering parameters. This interface also allows for integration of additional functions, such as process control and data gathering, which further enhances the model's capabilities. Overall, 3300 ICP XL is a powerful and highly accurate sputter equipment that is suitable for a variety of sputter applications.