Used PERKIN ELMER 4400 #293754989 for sale

PERKIN ELMER 4400 sputtering equipment is a powerful and versatile tool used in the analytical laboratory. It is able to deposit thin films of material onto substrates through the process of sputtering or reactive sputtering which prepares the substrate for further analytical techniques. 4400 is a modular system, offering flexibility and scalability. It includes a cathode, substrate holders, and a vacuum chamber. Sputtering systems, like PERKIN ELMER 4400, reconstitute material on the surface of a substrate in a vacuum chamber by ionizing a target material and sputtering the atoms onto the substrate. This process is characterized by the target material being vaporized in the sputtering process and then condensed onto the substrate surface in the form of a thin film. 4400 sputtering unit from PERKIN ELMER houses up to four high-performance cathodes and four crucibles in the vacuum chamber. The specific application characterizes the type of cathode used, and the source and RF power requirements, as well as the ultimate chamber pressure and pumping speed. PERKIN ELMER 4400 is also equipped with an automated temperature control machine, providing precision temperature regulation and measurement to ensure uniformity in the thin film deposition. This is critical for controlling the quality and properties of a thin film. The temperature control tool can accurately measure and monitor the process from -50°C to + 500°C. 4400 is further equipped with an integrated control line which enables setting, controlling and monitoring individual target sources and programs with an extensive range of parameters such as deposition rate, load and unload capacity, and substrate heating options. This ensures the thin film deposition process is completed effectively and efficiently. PERKIN ELMER 4400 sputtering asset provides superior thin film deposition and was designed to provide maximum performance. It is an ideal model for Materials, Physical and Medical research and offers researchers the flexibility and versatility they need to complete complex sputtering process. The automated control equipment allows for quick and precise thin film deposition, as well as allowing users to maximize their throughput and reduce process time.