Used PERKIN ELMER 4400 #9023631 for sale

PERKIN ELMER 4400 is a sputtering equipment commonly used in thin film deposition for research and development. The system features a 2-chamber configuration in which a target is placed in the main chamber and the substrates, such as semiconductor wafers, solar cells, and displays, are housed in the secondary chamber. The sputtering unit offers high-precision control of sputtering parameters such as temperature, pressure, voltage, RF and DC power, pulse time, pulse frequency, and pulse width. This allows for an even, consistent coating of the substrates with a uniform thickness and morphology. In addition, the machine can be configured for dual-cathode operation, enabling two materials to be deposited at once. 4400 is outfitted with advanced automation capabilities. It features a computer-controlled robotic arm with advanced vision recognition software that can detect the substrates during loading and unloading. This increases the throughput as the substrates can be efficiently transferred into and out of the chamber without manual intervention. The tool also offers a user-friendly graphical user interface (GUI) which allows for easy control and monitoring of sputtering processes. It can be operated remotely over an Ethernet connection, and it is possible to store process recipes, which is especially useful for large-scale production runs. Additionally, the asset features independent process control allowing the stirring speed and direction of the sputter gas to be adjusted. PERKIN ELMER 4400 has a wide range of applications, including semiconductor device manufacturing, battery, solar panel and display manufacture, data storage, optical filter production, and many others. The model is versatile enough to allow for custom coatings, such as multi-layer films, with excellent dimensional control, adhesion, and continuity between layers. Whether used as a standalone equipment or integrated into a complete production line, 4400 provides reliable, efficient sputter deposition. Its combination of state-of-the-art technology, including precision control of sputtering parameters, advanced automation, and a user-friendly interface makes it an ideal solution for research and production needs.