Used PERKIN ELMER 4400 #9077091 for sale

PERKIN ELMER 4400
Manufacturer
PERKIN ELMER
Model
4400
ID: 9077091
Wafer Size: 6"
Vintage: 2004
Sputtering system, 6" Sput down (3) Targets, round 8" RF/DC or Delta CTI Cryo pump and compressor Upgraded RF and DC power supplies Leybold D-30 MP Computer controller AE RFX-3000 and Pinnacle DC P/S turbo load lock Ferrofluidic table and elevator assy PC ripe control 2004 vintage.
PERKIN ELMER 4400 is a sputtering equipment used in the deposition of thin films, primarily for surface analysis, research, and industrial applications. This sputtering system can deposit uniform thin films of metals, alloys, semiconductors, and insulators and also provide a high degree of control over deposition rates. It works by bombarding a target material with ions of either Argon gas or an appropriate gas mixture, while the substrate is held in an ultra-high vacuum chamber. The 'sputtering,' or bombardment of the target material, causes particles to be ejected from the target material, which then travel across the chamber, and on to the substrate. The particles contain atoms from the target material which eventually create a thin film on the substrate. 4400 sputtering unit is a power efficient model, capable of producing high deposition rates, even with low power settings. It features an integrated argon saver which allows for the use of only as much gas as the process requires, and helps to reduce overall costs. It also uses a turbomolecular pump for improved vacuum results. This pump offers a pumping speed of up to 10,000 liters/second and can be customized depending on the needs of the project. The machine also offers a wide range of sputtering sources that provide the highest quality sputtering of various types of materials. It offers features such as independent control over temperature and current, as well as adjustable frequency levels. It also incorporates a robotic loader/ unloader tool that is compatible with up to 8 wafers or substrates, featuring a peak-to-peak transportation speed of up to 120 millimeters/second. The entire asset is also highly adjustable and customizable. The chamber can be rotated 360 degrees and moved up and down to provide the best view of the deposited materials and monitor the process. The model also offers robust monitoring and alarm systems, which allow for quick intervention into possible faults or issues. PERKIN ELMER 4400 sputtering equipment is fast, efficient, and reliable, and is a great option for projects requiring the deposition of thin films. With the right settings, the system can produce uniform and consistent films, through its use of high-quality sputtering sources and robotic loader/unloader feature. Additionally, the unit also features adjustable parameters, close monitoring, and alarm systems, providing peace of mind when it comes to precision and accuracy.
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