Used PERKIN ELMER 4400 #9161732 for sale

PERKIN ELMER 4400 is a sputtering equipment designed to prepare surfaces for a variety of intricate studies. The system utilizes a sputtering process which deposits a thin film of material on a variety of substrates for use in films, metal mask patterning, and other applications. The high-performance deposition unit utilizes an ion source to bombard the substrates with material, thereby producing a uniform, high-quality, and controlled thin-film om the surface. The machine is designed with a large working environment and includes a multi-gas manifold and gas panel to allow for the deposition of a wide range of materials. It can operate with up to three substrates and can be equipped with either conventional DC or DC-pulsed types of sputtering sources. The tool has a maximum sputtering rate of 2 nanometers per minute, allowing for a fast and efficient deposition process. 4400 is equipped with a magnetron source, which provides an improved deposition rate over linear sources. The asset is also equipped with an advanced controller to ensure process stability and repeatability, as well as a safety interlock mechanism. It also includes an automatic controller with features including pulsed power, multi-step sequencing, and recipe storage. The controller also has a built-in temperature monitor and automatic shut-off features. PERKIN ELMER 4400 has been developed for high-throughput deposition environments and has several ease-of-use features, such as a color graphical user interface with an auto-start feature. The model also includes an automatic substrate transfer mechanism and advanced diagnosis equipment, which ensures substrate stress-free transport. Additionally, the system can be expanded for multi-sputter applications, allowing for the deposition of multiple thin films. 4400 represents the latest in sputtering technology and can be used in a variety of applications, including targeted metal mask patterning, etching, and passivation. This unit offers the highest precision, repeatability, and control available for sputtering devices, and can be used in a variety of different research and industrial settings.