Used PERKIN ELMER 4400 #9262973 for sale

PERKIN ELMER 4400 is an advanced sputtering equipment designed to deposit thin films and layers of metal and other materials onto semiconducting substrates. It's a compact system which offers high sputtering rates and uniformity, with a 10-300 W power range. The unit has an easy 4-inch wafer size deposition capability, with a 3-target sputtering module, each capable of applying 12-15 materials.. It features a flat LCD touch screen gauge, a built-in temperate and gas management machine, and an adjustable double-mesh electro-magnetic shield. The key features of 4400 are the high rate sputtering rate, the excellent uniformity, and the easy adjustment of the sputtering parameters. The tool has three independent target chambers and is capable of various substrate configurations. It has an adjustable substrate temperature range of about -120 - +400 °C, and a powerful gas management asset. The adjustable pressure range is 1-5mbar. For control, PERKIN ELMER 4400 is equipped with an advanced Auto-Assembly programming software, which allows it to process and calibrate the target counter parameters, as well as to program custom deposition modes. The model also comes with a dual X-Y stage configuration robotic arm for precise positioning of both targets and substrates. To enable a smooth material transfer, the equipment is equipped with an automated 2-axis rotary transfer module, which ensures uniformity across the entire surface. 4400 is also equipped with a tight residual gas analyzer, giving users previously unheard of control and precision over their material deposition processes. In summary, PERKIN ELMER 4400 is an advanced sputtering system capable of precise thin film deposition with excellent uniformity, all within a compact unit. Its powerful features provide users the means to control their material deposition processes with more precision and accuracy than ever before.