Used PERKIN ELMER 4400 #9268770 for sale

PERKIN ELMER 4400 is a fully automated sputtering equipment designed to offer complete control over a range of deposition parameters. Through its advanced features, the system allows for a wide range of thin film coating and substrate processing applications. 4400 is an advanced sputterer unit made up of two parts. The first is a high vacuum turbo molecular pump which houses two sputter guns, and the second part consists of a high vacuum wide opening bell jar deposition chamber. The bell jar has a diameter of approximately 45 cm, and is capable of deposition of metals, dielectrics, and insulators at high temperatures. This chamber is housed in an isolated enclosure to provide additional protection and clean air in the deposition process. The machine also includes a high-precision, multi-segment substrate holder to ensure accurate and reliable deposition of thin films at a range of angles. PERKIN ELMER 4400 features a control tool which can be programmed to accurately control the parameters of the deposition process. The asset is capable of setting target voltages, ion beam currents, and film thicknesses with high accuracy and consistency. Additionally, the model can be programmed to automatically adjust deposition parameters to optimize deposition rates and minimize settling time. The equipment is designed to offer high repeatability and accuracy, allowing for reliable and high-yield sputtering performance. Furthermore, it offers an advanced closed-loop control system to ensure optimal film thickness and film uniformity. Additionally, the unit is equipped with an integrated filtration machine to ensure protection from both air and sputtered particles. 4400 is a reliable and efficient sputtering tool which can be used for a wide range of thin film coating processes. Its advanced features and control asset allow for reliable sputtering performance with high accuracy and repeatability. This model is ideally suited for demanding applications, offering superior results and high-yield performance.