Used PERKIN ELMER 4400 #9283424 for sale

PERKIN ELMER 4400 is a sputtering equipment used for thin film deposition. It is a multi-purpose sputtering station that can be used to deposit a variety of materials, such as metals, alloys, ceramics, and polymers. It is ideal for fabricating high quality optical, electrical, and semiconductor coatings on a range of substrates. The system features two independent high-vacuum chambers, which allows for simultaneous deposition on two different substrates. The unit is capable of working with substrates up to 8" in diameter, and can create ultra-thin films that range in thickness from 0.5nm to up to 2µm. Optimal vacuum levels can be reached quickly and easily, and the rotating circular cathodes ensure uniform deposition over large area substrates. 4400 allows for the creation of extremely precise and uniform thin films using DC magnetron sputtering systems. The two independent power supplies, which are capable of producing up to 2000 watts of total power, enable accurate control over deposition rates. High levels of process control can be achieved using the adjustable secondary electron current (SEC), which enables fine-tuning of the sputtering process. The built-in display feedback machine provides instant measurement feedback on important parameters such as total ion current, SEC current, wafer detector, target holder temperature, and substrate temperature. The integrated controller also provides accurate control over bias voltages, shutter and closing, gas inlet, and more. In conclusion, PERKIN ELMER 4400 is an advanced multi-purpose sputtering tool used to create high-quality thin films for a variety of applications. Its two independently powered chambers, built-in display feedback, adjustable SEC current and other features allow for precise process control and uniform deposition of materials on large area substrates.