Used PERKIN ELMER 4410 #293805512 for sale

PERKIN ELMER 4410 is a sputtering equipment designed for deposition of thin films. The system is designed for balanced and highly efficient evaporation, sputtering and oxygen plasma deposition of metals, liquid quench, ceramic oxides and intermetallic compounds. It is equipped with four cathodes and two e-beam sources for deposition and etching. 4410 features a dual chamber design, including a process chamber and a differential pumping chamber. The unit offers four cathodes with direct and pulsed sources for evaporation, sputtering and oxygen plasma deposition of metals, liquid quench, ceramic oxides and intermetallic compounds. This machine also includes an external partial-pressure differential pumping tool, allowing accurate control of atmosphere in the process chamber. It also includes a mini-lock valve mechanism to allow selective venting of the chamber. The asset's sputtering sources feature advanced modes of operation such as direct sputter, ion bombardment and cascade deposition. In order to provide the highest quality films, the model is equipped with two E-beam sources. The sources operate over a wide range of energies (0 to 6kV) and feature a variety of options for accelerating decelerating and pulse width. The digital depth controller provides precise depth control of sputtered films. The E-beam sources also include a vacuum bake equipment for pre- and post-etching processes. The system also includes an automated sample changer to provide automated deposition of films on multiple substrates. PERKIN ELMER 4410 includes a range of safety features. The unit includes s t w o s t a g e heat exchanger and programmed temperature control machine for accurate temperature control during processes. The tool also includes a single stage turbo pump providing a partial pressure of up to 5 mbar on the process chamber. Additionally, the asset is designed with automated shut down capability in case of model malfunction. To ensure accuracy, 4410 is designed with a powerful controller. The controller features a graphical user interface and touch screen for easy programming and operation. The controller also features real-time monitoring of the equipment parameters via an on-board PC. This system also includes a calibration unit for controlling power and voltage for optimal deposition across substrates. The controller also allows for easy entry of recipes. PERKIN ELMER 4410 offers a robust design with excellent features for sputter deposition and etching. The machine includes advanced sources and a range of safety features to generate consistently high quality films. Additionally, the controller provides accurate real-time monitoring of tool parameters. This asset is ideal for deposition of various materials across a range of substrates.