Used PERKIN ELMER 4410 #53099 for sale

PERKIN ELMER 4410 is a vacuum sputtering equipment designed by PERKIN ELMER Corporation for thin-film deposition applications. The unit is an industrial grade sputtering system that provides a reliable source of mechanical and electrical power to various sputtering processes. It offers high performance, long-term reliability, and enriched sputtering processes. The main feature of this sputtering unit is its intelligent sputtering process control. This makes it highly suitable for any thin-film deposition application that requires precise control over the sputtering process. 4410 possesses a controllable gas flow, substrate temperature, RF power, and process pressure. In addition, it supports pulsed DC magnetron sputtering, enabling the user to program for higher deposition rates. The machine is adaptable for a wide variety of substrates such as glass and ceramics. It also supports rotation of the sputtering chamber to reduce substrate damage. The ability to collaborate with helium leak and pressure controller systems makes PERKIN ELMER 4410 a comprehensive sputtering tool for thin-film deposition processes. It can easily be adjusted for optimum performance and user satisfaction. The asset also offers flexibility in process parameters such as effective plasma power, uniformity, chamber throughput, and position-dependent density control. In addition, 4410 also supports dynamic process compensation, which ensures that the model can maintain target position accuracy. PERKIN ELMER 4410 has many safety features including over temperature protection and ground fault isolation. It has an enclosed chamber eliminating undesired contaminants, reducing the risk of contamination and improving the equipment's reliability. 4410 provides a high-performance, reliable, and safe thin-film deposition process at a reasonable cost. It has the features that make it ideal for research, development, and production applications. This system is an excellent choice for high quality and low-cost thin-film deposition processes.