Used PERKIN ELMER 4450 #153442 for sale

PERKIN ELMER 4450 is a sputtering deposition equipment used for physical vapor deposition (PVD) of materials in the semiconductor industry. It is a modular system featuring two sputter chambers with turnkey loading and unloading capabilities, as well as dedicated substrate holder assemblies. 4450 is a fully automated sputtering unit controlled by a process-monitoring touchscreen interface that displays all machine information. The robotic loading and unloading allows for rapid, consistent substrate transfers. This tool also includes an automated vacuum cleaning and maintenance cycle to ensure repeatable, reliable operation. PERKIN ELMER 4450 is equipped with five sputtering sources—an electron beam gun, three planar magnetoplasma sputtering guns, and a vertical magnetoplasma source. The electron beam gun sprays highly uniform, thin-film deposits, while the magnetoplasma sources are designed for larger-area, thicker-film applications. The spot size for the electron beam gun is 5 mm, allowing for very precise deposition of high-resolution features. 4450 uses advanced sputter deposition and dynamic ion beam etching technologies. This allows for the application of complex and precise layering patterns on substrates such as wafers, chips, and boards. The substrate temperatures are adjustable from room temperature up to 400°C, allowing for a variety of material deposition. A variety of different gases are used in the sputtering process, such as argon, oxygen, and Nitrogen. They are charged and heated in the chamber, then accelerated towards the substrate in the form of ions. When the ions hit the substrate, they cause the target material to be sputtered—or blown—off the substrate. This deposition process builds up a thin film on the surface. PERKIN ELMER 4450 is a reliable and efficient sputtering asset suitable for a variety of PVD applications. Its automated processes, precise deposition capabilities, and reliable operation make it a valuable addition to a variety of industrial and research applications.