Used PERKIN ELMER 4450 #9113778 for sale

Manufacturer
PERKIN ELMER
Model
4450
ID: 9113778
Vintage: 2000-2005
Sputtering system TaN process Omron PLC Control (2) Gas (2) Delta target (1) AE MDX-5 PS CT-8 Cryo pump Pallet, 6" No etch, LL heat Currently installed 2000-2005 vintage.
PERKIN ELMER 4450 is a sputtering equipment designed for thin film deposition of applications. This system includes a single source magnetron sputter and electron beam evaporation. The sputter source has a 16-inch diameter and is composed of a stainless steel target, a graphite armature, and a magnet power supply. The evaporation source has three heating units, each equipped with a filament power supply with a heated filaments for electron beam evaporation. The unit provides a number of controllable parameters to control the process. The sputter source power, filament power, distance between the target and substrate, and current and bias can all be adjusted. The evaporation source consists of three individual heating units, which can be individually manipulated and can be used in series or in parallel. The power to the heating units and geometrical configurations can also be adjusted. The machine is designed with safety features to prevent overheating. It is designed to accept most conventional types of vacuum pumps and is equipped with temperature sensors, pressure sensors, vacuum lines, LED display, and a control board. It can also be operated remotely, using a standard Ethernet connection. In addition to the standard sputter tool, 4450 also comes with several optional accessories. These include a sputter coater, a substrate heating element, and a substrate support asset. The sputter coater is designed to evenly sputter materials with uniform speed, while the substrate heating element is used to help maintain uniform temperature throughout the chamber during evaporation. The substrate support model provides precise alignment and installation of substrates, allowing for accurate thin film deposition. PERKIN ELMER 4450 is a reliable and efficient sputtering equipment designed for deposition of thin film applications. Its versatility makes it suitable for a range of applications, including dielectric, organic, and metals thin-film deposition. Its numerous control features allow for precise manipulation of the process, while the variety of optional accessories provide additional flexibility.
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