Used PERKIN ELMER 4450 #9114028 for sale

PERKIN ELMER 4450 sputtering equipment is a versatile, high performance vacuum deposition system that is ideal for a wide range of thin film applications, particularly metal, ceramic, semiconductor, and oxide layers. 4450 unit features an electrostatic chuck for repeatable wafer uniformity, an automated shutter for substrate protection, and a proprietary multiple magnetron stack arrangement. These features provide uniform deposition of thin film materials that are essential for integrated circuit applications. PERKIN ELMER 4450 uses Direct Current (DC) power supplies with up to 500 Watts of adjustable sputtering power, and up to four independent sources can be used for simultaneous deposition. This allows the operator to deposit multiple thin films in a single chamber, increasing process throughput. The sputter sources can be operated independently to ensure precise control of material composition and deposition rate, with high uniformity over the substrate. 4450 machine offers superior sputter process control and enables the use of a wide range of sputter targets, metals, and oxides. The advanced magnetron design allows for excellent beam profile control over large substrates; resulting in uniformity across the substrate. The tool offers precise process control with integrated temperature and sensor feedback, ensuring proper target-to-substrate spacing as well as consistent per-pulse sputtering power levels and uniform target utilization. The intuitive PC-based graphical user interface ensures ease of use, with one-button start/stop sequencing and real-time display of target current, substrate temperature, sputtering rate, and film thickness. Automated substrate load and unload allows for efficient, convenient sample handling and faster processing times. Overall, PERKIN ELMER 4450 sputtering asset is an excellent choice for researchers and businesses looking for an automated, high performance model for thin film deposition processes. With its versatile features and flexible process control, it can accommodate a wide variety of applications, from integrated circuit development to metal coating and protective layers. The equipment's user-friendly interface and reliable performance make it a great addition to any laboratory.