Used PERKIN ELMER 4450 #9199550 for sale
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ID: 9199550
Wafer Size: 8"
Sputtering system, 8"
Wafer loading: Manual with load lock
Cathode:
(3) Delta shapes
(4) Circle shapes
Sputter method:
RF/DC
Diode / MAGNETRON
Process chamber:
8" Diameter x 12" High stainless steel cylinder with 6"
CF Flange view port and load lock port
28" Diameter stainless steel base plate
11/2" Air operated roughing isolation valve
Air operated gas inlet valve
Air operated vent valve
11/2" Blanked-off leak check port
Removable deposition shields
23" Diameter, 3-position water cooled annular substrate
Table with variable speed motorized table drive
Full circle shutter and vane shutter
Chain drive pallet carrier transport
Heavy duty electric hoist
Load lock:
30" x 28" x 8" Stainless steel load lock chamber
Aluminum cover
Chain drive pallet carrier transport
2" Air operated roughing isolation valve
Air operated vent valve
23" Diameter molybdenum annular substrate pallet
Elevator for pallet up and down function
Vacuum systems for process chamber:
(2) Stage cryo pumps
With 1000 l/s pumping speed for air
Includes:
Chevron
Water cooled compressor and lines
Automatic regeneration controller
Plumbing kit, 71/2"
Aluminum air operated gate valve: 6" ASA
Air operated venetian blind throttling valve
Mechanical pump or dry pump for process: 36.7 Cfm
Chamber and load lock
Gas line with MFC
N2
O2
SCCM
Customized
System PC control
Options:
Gas lines with MFC
N2
O2
Customized
Lamp tower alarm with buzzer:
Mechanical pump / Dry pump for process chamber and load lock
Independent mechanical pump / Dry pump for process chamber
Chiller for cooling plates and table
Turbo pump for load lock
Load lock lamp heating function: Up to 200°C
Chamber lamp heating function: Up to 300°C
Plasma etch function
Bias function
Co sputter function
Reactive sputter function
Materials:
AI+W
InSnO
AI2O3
Ag_
Au
C
Cr
Cr/Co
Cr/Au
Cr+Cu
Cr/Si
Cr/SiO
Cr/Si02
Si02
Mo
MoSi2
Mo2Si5
Mc>5Si3
Ni
Ni/Cr
Ni+Ni/Cr
Ni/Fe
Pt
Ti02
SiC
Ti/W
Si02+02
Si+N2(Si3N4)
Si+N2+B4C
Ta
TaC
Ta+Au
TaSi2
Ta+Si02
Zr
Ti02+Cr
Ti+Au
Ti+Au+Ni
Ni/Fe+Cu+Si02
Ti/W+Au
Ti/W+Au+Ta
Ti/W+AI/Si
Ti/W+Ni/Cr+Au
Ti/W+Pt
Al+Ti/W+Ag
W+AI2O3
Zn
Zri02
Basic configuration
Main frame
28" Diameter SST chamber top plate with ports and cathodes:
Configuration 4400 4410 / 4450
Cathode shape Circle Delta
Cathode size 8" Delta
Cathode quantity 1 to 4 1 to 3
Sputter power supply:
4400 4410 / 4450
DC Power 5 kW 5 kW / 10 kW
RF Power 1kW / 2kW 2 KW / 3 kW
Pulse DC Power 5 kW 5 KW / 10 kW
Power distribution box: AC380 V / 208 V / 3 Phase.
PERKIN ELMER 4450 is a high-performance sputtering equipment designed to deposit thin layers of materials onto various substrates. It utilizes magnetron or ion bombardment deposition techniques to create ultra-smooth layers of metal films, oxides, and various other materials. The system includes two 3-inch DC sputtering electrodes and a large vacuum chamber ideal for low-temperature sputtering operations. The high-performance magnetron sputtering process in 4450 employs an efficient and highly reliable cooling unit to ensure maximum performance and operational longevity. By using argon or nitrogen gas at high pressures, the machine is able to create superior film properties with optimum deposition rates. The tool is also equipped with advanced bead-cleaning technology for improved lifetime of the asset components. The model requires minimal maintenance and offers superior vacuum pumping. Its low operating temperature helps to minimize substrate heating and improve the quality of the cover layer. The equipment also includes a high-precision capacitance thickness monitor with a pulse-regulating monitor to ensure excellent layer deposition. This monitor also allows for different sputtering currents, providing users with an ideal level of control over the coating process. The easy to use interface of the systems allows the user to quickly and easily change between different sputtering parameters and target materials. Its low-noise operation makes it safe and reliable to use for prolonged periods of time. It has a compact and lightweight design that making it easy to store and transport to different workstations. PERKIN ELMER 4450 is the ideal choice for laboratory and industrial sputtering processes. Its advanced features and easy-to-use interface make it an ideal choice for those looking for superior layer deposition and superior performance. Its advanced cooling system and low-current instruments makes it highly reliable and efficient for low-temperature sputtering operations.
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