Used PERKIN ELMER 4450 #9226951 for sale

Manufacturer
PERKIN ELMER
Model
4450
ID: 9226951
Sputtering system DC Gun (2) RF Guns, 8" (Round) PERKIN ELMER RF Matching network included Turbo pumps load lock and process chamber Substrate pallet: RF Bias Mechanical pump (2) Turbo pumps Base pressure: Normal: >5 e-7 Torr Substrate size: 2" to 6" Henry RF power supply ENI RF Power supply.
PERKIN ELMER 4450 sputtering equipment is designed to deposit thin films of high purity metal or insulator targets onto a variety of substrates and is a widely recognized sputtering system. It is a highly capable tool for producing high-quality thin film materials for a range of electronic, automotive, and other industrial applications. The unit is powered by an easy-to-use touchscreen computer interface and features robust chamber construction, dual-source ion pumps, and a high-precision, low drift turbomolecular beamline for ultimate selectivity. 4450 sputtering machine utilizes dual ion source pumps in order to provide a high vacuum environment necessary for material deposition. This is done by utilizing an angle-cut, cyclone, ion source chamber to create the thin film layer desired on the substrate. The chamber is lined with a titanium quartz window which permits the simultaneous deposition of up to two targets at once, and also provides protection for the chamber from exposures to polar solvents. A built-in temperature controller ensures the sputtering chamber walls remain at a stable temperature which is critical to meeting the stringent requirements of the application. The beamline of PERKIN ELMER 4450 sputtering tool is capable of robust sample deposition while maintaining a high degree of control. This is accomplished through an integrated control asset which provides accurate settings and control of the beam profile for optimal precision and uniformity. Furthermore, the model also features advanced patterning functions such as the ability to obtain a uniform edge-to-edge sputtered coverage, thin uniform layers, and large-area patterning for specialized products. For reliability, the equipment utilizes a dual-source ion source assembly which is capable of quickly heating and cooling the system in order to quickly prepare the chamber for various operations. This ensures that all sputtering operations are performed with consistent pressure, temperature, and vacuum levels. Furthermore, it is outfitted with a robust titanium quartz window which can withstand harsh cleaning agents used in the deposition chamber. Lastly, built-in safety features ensure that the unit complies with international regulations and requirements for cleanroom operations. 4450 sputtering machine is a reliable and capable instrument for forming high-quality thin-film materials that meet the exacting requirements of a range of electronic and automotive applications. The tool is equipped with a touchscreen computer interface, dual-source ion pumps, and advanced patterning functions that allow for tailored control of the deposition process. Robust chamber construction, along with an integrated control asset and titanium quartz window ensures uniformity and precise patterning of thin film layers, making PERKIN ELMER 4450 a reliable and highly capable sputtering model.
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