Used PERKIN ELMER 4450 #9262871 for sale

PERKIN ELMER 4450 is a high-performance poly-crystalline target sputtering equipment designed for a wide range of sputtering and deposition applications. It features a advanced computer-control sputtering process environment which provides flexibility for advanced process control and sputtering rate monitoring. The system has been designed to provide for a wide range of sputtering strategies, allowing for the deposition of high-quality, uniform films such as metal oxides, SiO2, and highly conducting films. The unit operates in a wide range of pressures, from low vacuum up to moderate vacuum, allowing for deposition of large-size and patterned samples. It is equipped with a large target chamber with a rotatable cathode assembly which allows for the sputtering of more than 4500 individual targets. The machine is equipped with a number of computer-controlled parameters such as sputtering pressure, deposition temperature, arrangement of the targets and target opening. It also allows for precise control of the sputtering rate and uniformity of the film over the entire surface area of the substrate. The tool is also suitable for sputter-etching and high uniformity rates. It features a 3-axis, single-stage magnetic field generator with a maximum of 150 mT, which ensures an even sputtering profile and uniform deposition rate. The sputter rate controller, operated through a PLC microprocessor, ensures precise control of deposition rates and reduces process time. The asset also has a number of user-friendly features including a web-based GUI, which allows for remote control and monitoring of the sputtering process. The model is equipped with an optical emission spectrometer, micro-balance, magnetron sputtering source, argon ion source, thermocouple, E-beam evaporator, and a vacuum pump. This equipment includes a versatile chamber with an advanced vacuum system which provides a clean, low-pollution environment. The unit is cooled by the use of energy efficient liquid cooling systems, which maintain the sputtering chamber at a consistent temperature for the desired process. In summary, 4450 is a modern, high-performance sputtering machine designed for a variety of sputtering and deposition applications. This tool allows for easy process control, excellent rate control, and uniform films. The asset also includes a reliable vacuum model and a number of user-friendly features which make it suitable for a large variety of processes.