Used PERKIN ELMER ICP 2000DV #9231262 for sale

PERKIN ELMER ICP 2000DV is a professional sputtering equipment designed for physical vapor deposition of thin films for research and industrial applications. This advanced sputtering system features a 4-axis manipulation unit for uniform deposition and it comes with a high-vacuum chamber with large access door for easy loading and unloading. The major components of this machine include a magnetron sputtering cathode, a substrate holder, a controller for manipulation of the substrate, an RF power supply, and a high-vacuum pumping tool. The asset is capable of producing extremely uniform thin films of approximately 0.2-100 nm thickness. The magnetron sputtering cathode uses argon or other inert gases to generate a plasma to bombard a target material with either positive or negative ions. The target material is then sputtered onto the substrate at high speeds. The substrate holder is responsible for manipulating the substrate in order to ensure uniform deposition, and it is able to rotate, tilt, and spin the substrate. The controller allows users to program parameters such as deposition rate, uniformity, and process power. The RF power supply is responsible for providing the high-voltage and low-frequency signals needed for high sputtering rates. It is capable of providing precise power control with stable and repeatable process parameters. The high-vacuum pumping model is used to maintain high level of vacuum for efficient deposition. It consists of multiple vacuum stages and capable of reaching an ultimate vacuum of <2 x 10-6 Torr. The equipment is also equipped with software and hardware that enables users to easily monitor and control the whole process. The software features visualization and data logging capabilities with an easy-to-use graphical interface. The hardware includes an X,Y,Z, and theta motor controls for precise manipulation of substrates in the deposition chamber, and a cumulative timer that records the total operating time of the system. PERKIN ELMER ICP 2000 DV is an ideal choice for research and industrial applications that need deposition of thin films to a very high precision. This advanced sputtering unit is capable of producing quality thin films for various material applications and its user-friendly software and hardware features make it easy for users to monitor and control process parameters.