Used PERKIN ELMER ICP-OES 7300 #293671065 for sale

PERKIN ELMER ICP-OES 7300 is an advanced sputter deposition equipment designed for thin film deposition via sputtering. The system offers unparalleled control, creating thin film coatings with consistency and precision. The sputtering process is carried out in a vacuum chamber with a pressure range of 5×10-4 to 5×10-7 Torr, enabling precise and consistent film deposition. The intuitive unit puts the user in control of all conditions in the chamber for optimal film growth, and fast deposition rates of up to 8nm/s are available. An advanced machine controller and two advanced sensors ensure the deposition process always goes according to plan. ICP-OES 7300 comes with an expansive range of sputtering targets, offering the user the ability to extend the range of sputtering applications beyond traditional materials. With a wide choice of target materials, the tool is suitable for coating a range of materials, including metals, oxides, nitrides and carbonitrides, allowing the asset to suit a variety of thin film coating needs. The model is designed for process optimization, with a range of process parameters allowing the user to tailor their film deposition process for a specific need. These parameters include the sputter gas type, the voltage and power of the magnetic field, the pressure range of the vacuum and the deposition rate. A controller application connected to the equipment affords even more control over the process, giving the user more flexibility for fine-tuning of the parameters. In order to maintain a consistently high-quality deposition, the system is also equipped with advanced features such as a dwell time control function and a uniform gas dwell distribution module, which helps to ensure equal gas distribution within the vacuum to avoid coating defects. An additional advantage of the unit is its safety features, which include advance AR atmospheric gauges, dual gas separation chambers and a remote operation machine (ROS) which minimizes exposure to hazardous goods. To maximize deposition efficiency, PERKIN ELMER ICP-OES 7300 is equipped with a dual magnetron source, which is capable of performing uniform deposition at highest deposition rates possible. The tool is also designed for flexibility, with a range of optional backside-loading fixtures for substrates up to 150mm in diameter. In conclusion, ICP-OES 7300 offers advanced thin film deposition capabilities via a sputter deposition process with unparalleled control. With versatile sputtering targets, process control, advanced safety features and fast deposition rates, the asset is an excellent solution for thin film coating needs.