Used PERKIN ELMER ICP-OES 8000 #9205302 for sale

PERKIN ELMER ICP-OES 8000 sputtering equipment is a highly advanced system which is capable of measuring the quantity and composition of elements at nanoscale resolution. This unit utilizes the physical-chemical process of sputtering to deposit a thin film onto a substrate. The process involves bombarding the material surface with energetic particles or atoms in order to sputter off a thin layer of material which can then be analyzed for its elemental composition. ICP-OES 8000 is typically used to deposit thin films on substrates such as metal, glass, polymers, ceramics, and semiconductor materials. The sputtering machine is highly accurate and reproducible with lateral resolutions which range from 10nm to 100nm. The tool can deposit films of different thickness, ranging from 500 nm up to 5000 nm, depending on the substrate materials and the energy of the energetic particles which are used. PERKIN ELMER ICP-OES 8000 asset is powered by a computerized control model. The interactive, multipurpose control panel offers an adjustable number of steps depending on the desired deposition. The sputtering equipment is also equipped with a unique multi-channel optical emission spectroscopy detector which can accurately measure the quantity and composition of elements at nanoscale resolution. The sputter system is also designed to reduce contamination. Its low pressure operation ensures that the process takes place in a vacuum and the materials are protected from contamination by micro-organisms and other particles which are present in the atmosphere. The unit is also designed to be easy to operate and maintain. Its user-friendly software allows operators to quickly and accurately adjust parameters to ensure that the optimal rate of deposition and material composition are obtained. Overall, ICP-OES 8000 sputtering machine is a highly advanced tool which offers nanoscale resolution and low contamination. The asset's exacting measurements, coupled with its user-friendly design, make it an ideal choice for the deposition of thin films on substrates of various materials.