Used PERKIN ELMER / RANDEX 3410-6J #9275483 for sale

PERKIN ELMER / RANDEX 3410-6J is a multi-target sputtering equipment that is capable of evaporating multiple materials at the same time. It is ideal for the deposition of thin films for various applications, including flat panel displays, optical coatings, and packaging. The system features a high vacuum multi-layer magnetron sputtering source that uses magnetic fields to direct ions towards the substrate materials to create thin films. It uses four deposition sources, two 6-inch targets and two 4-inch targets. The 6-inch targets can be used for substrate materials up to 6 inches in diameter. The 4-inch targets can be used for smaller substrates. The unit also features an in-situ DC monitoring machine so users can track and record their deposition processes in real time. An integrated controller operates the tool's main vacuum and auxiliary rotary pumps as well as controlling the sources. The controller also acts as the interface for the in-situ DC monitoring asset, allowing for measurements to be taken at any point in the process. The model includes an internal loadlock, which allows for sample changing to be done without the loss of vacuum. The internal loadlock is also equipped with an automated sample handling equipment, making it easier to change substrates from one location to another. The system is capable of sputtering different materials, including metals, alloys, oxides, and nitrides. It includes a multi-target capability, allowing for the creation of complex thin film structures. It also includes a planer source configuration and a dual plasma source configuration, which allows for different film densities and thicknesses in the same deposition job. The unit is capable of sputter deposition rates up to 6 nanometers per second on aluminum and up to 1 nanometer per second on silicon. Its base pressure of less than 2×10-ten Torr allows for very good vacuum performance. The machine is also capable of uniform deposition of both conductive and non-conductive films. The tool is user-friendly and includes various safety features such as a mechanical interlock, open chamber detection, closed chamber detection, and electronic circuit breakers. The asset is also equipped with a host of other features, including an integrated purge when releasing and re-pressurizing the chamber. RANDEX 3410-6J is an ideal choice for users who require a multi-target sputtering model that is capable of precise thin film deposition. Its sophisticated technology and advanced safety features provide users with an efficient and effective solution for their thin film deposition needs.