Used PLASMA SCIENCES ARC12M #293646048 for sale

ID: 293646048
Sputtering system Target diameter, 8".
PLASMA SCIENCES ARC12M is an advanced magnetron sputtering equipment intended for industrial applications such as thin film deposition, coating and insulation. The system is capable of deposit coatings of breadth and complexity for a wide range of materials. It is suitable for single layer and multilayer applications on a variety of substrates. The unit utilizes a unique, patented advanced plasma arc source technology which is able to produce higher power densities and higher deposition rates than traditional magnetron sputtering systems. This enables the machine to deposit metal, ceramic, dielectric and photocatalytic layers. The tool is further enhanced with the ability to operate reliably across a range of process parameters. ARC12M is designed with several safety features, allowing it to pose minimal risk to operators and other personnel. The asset's ion source is modular, meaning operators can quickly and easily swap out target plates and incorporate new materials into the sputtering process. This allows for maximum flexibility in production. PLASMA SCIENCES ARC12M is capable of working at various power levels and includes an optional low-powered mode for target material manipulation. This mode requires significantly reduced target power, allowing users to carry out delicate machining processes without destabilizing the process and exposing the target material to undesired temperatures. The model is designed to work with a variety of gases, including argon, oxygen, and nitrogen. This allows users to deposit films with varying stoichiometry and contamination levels by adjusting the gas pressure. Additionally, the equipment provides uniform sputtering rates with a broad ion angle distribution, resulting in superior uniformity of films across all substrate surfaces. ARC12M also features an integrated remote control/monitoring interface and variable process pressure chambers. This allows operators to adjust the pressure inside the chamber quickly and easily, depending on the type of coating desired. This helps ensure that the substrate and film remain properly protected from external contaminants. Overall, PLASMA SCIENCES ARC12M is an advanced, feature-rich sputtering system which provides reliable performance for a variety of industrial applications. Its low-powered mode and modular ion source also make it an ideal choice for delicate applications, while its integrated remote interface and pressure chambers ensure superior uniformity for films deposited on all substrate surfaces.
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