Used PLASMA SCIENCES HRC 200 #10010 for sale

ID: 10010
Wafer Size: 8"
table top sputtering system, 8" Turbo Pump 15 minute pump down time to 5x10e-5 torr Does not have a power supply Requires either a DC power supply or a RF power supply Power supply should be 200-300 watts.
PLASMA SCIENCES HRC 200 is a versatile and compact high rate sputtering system capable of deposition of a wide range of materials for various applications. It is capable of realizing high-rate deposition with long-term repeatability and uniformity that is desired for many applications such as disk drive head layers, substrates, MOS/MEMS, and high-end consumer electronics. HRC 200 is based on radial magnetron sputtering technology to deposit nonmagnetic materials onto a variety of substrates including aluminum, stainless steel, quartz, glass and silicon. The advantage of this technology is that it enables both the coating of large and small areas and the deposition of very thin, highly uniform layers. The HR-200 is capable of depositing a range of metals, ceramics and other materials, such as aluminum oxides, chromium, titanium, silicon nitride, iron oxide, and many other compounds. It also utilizes a host of advanced technologies such as ionized physical vapor deposition (IPVD) and high power impulse magnetron sputtering (HIPIMS). Its advanced plasma source enables the deposition of extremely uniform layers, with especially high uniformity across large substrates. The HR-200 also utilizes advanced control panel, temperature and pressure monitoring systems to ensure uniform and repeatable deposition. This system is designed for low-cost coating on large substrates with superior uniformity. Its small footprint and lightweight construction make it very easy to transport and makes it suitable for lab or industrial use. PLASMA SCIENCES HRC 200 is easy to use and maintain with automated monitoring of chamber pressure and deposition rate. It also includes an integrated substrate-to-substrate rotation system to improve uniformity over large substrates. Furthermore, nearly all operations and conditions can be monitored and managed remotely via internet connectivity. Overall, HRC 200 is an ideal solution for high-rate sputtering of metals and metal-oxide materials with superior uniformity and repeatability. It offers a powerful, compact and flexible coating solution for a variety of different applications. By taking advantage of its advanced technologies and remote monitoring, PLASMA SCIENCES HRC 200 delivers reliable and repeatable deposition processes with exceptional repeatability and uniformity.
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