Used SEMICORE MRC-943 #9275511 for sale
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ID: 9275511
Wafer Size: 6"
Seed layer deposition system, 6"
Process chamber
(3) Targets:
T1: TIW
T2: CR
T3: CU
Process chamber ultimate vacuum: ≤5.0E^-6torr
Loadlock ultimate vacuum: ≤5.0E^-6torr
Process gas: Ar
Process gas flow: 0 ~ 100sccm
Process pressure control range: 0 ~ 20mtorr
RF Power: 0 ~ 1500 W
DC Power: 0 ~ 10 kW
Film uniformity: ≤5%
Spare parts included.
SEMICORE MRC-943 Sputtering Equipment is one of the most advanced sputtering systems available on the market. It is a powerful, versatile, and cost-effective system that is ideal for a wide variety of applications. SEMICORE 943 utilizes magnetic radial compression technology to achieve high throughput rates with a consistent, uniform deposition of sputtered material. With the inclusion of a unique, 3-axis motion control to precisely control the sputtering rates and the angle of the target material, the unit is capable of achieving very high precision and accurate deposition. The advanced controller also allows for remote control and monitoring of the machine via the internet. MRC-943 is built for large production runs, with a large sputterspot size accommodating substrates up to 200mm in diameter. Unlike other sputtering systems, 943 utilizes a unique shunt stage to discharge particles produced during the sputtering process, thus allowing for higher quality deposition and longer run times. In addition, the tool allows for rapid substrate changes, eliminating the waiting times associated with other sputtering systems. The powerful controller and advanced software of SEMICORE MRC-943 enable users to program the asset to deposit sputtered material in a variety of ways. Patterning and etching can easily be done with the model, and the sputtering process can be automated according to user-defined parameters. The equipment is powered by a high-efficiency RF power supply, and includes a range of easily interchangeable, removable ceramic targets, providing a wide range of deposition possibilities. SEMICORE 943 also has advanced computer-controlled temperature control and vacuum systems, allowing the operator to precisely adjust the temperature of the target and substrate during the deposition process for optimal results. Overall, MRC-943 Sputtering System is an advanced unit perfect for a variety of applications. With its powerful control systems, wide range of deposition possibilities, and automated programming capabilities, this machine is a great choice for any research or production environment.
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