Used SHIBAURA CFS-8EP-55 #293608660 for sale

SHIBAURA CFS-8EP-55 is a sputtering equipment which has been designed for the fabrication of thin film semiconductor devices. This machine is a powerful, versatile tool for creating thin films for a variety of applications, including: thin-film photovoltaics, display technologies, thin-film MEMS devices, and thin-film biosensors. The sputtering system operates at a low pressure and requires both a vacuum chamber and two or more plasma sputter sources. The chamber is made from stainless steel and is capable of a maximum pressure of 3.2×10-1 Pa. Inside the chamber, a pair of circular magnets - referred to as a magnetron - surrounds the target material to increase the plasma density by compressing and focusing the ions. This increases the rate of target material emittance into the chamber, resulting in improved rate and uniformity of thin film deposition. The sputtering unit is equipped with two sputter sources for improved build rates. The LPH-30P comprises two modular power supplies, a phase shift circuit that can be used to control the relative phase to the two sources, and two omnidirectional 0.8 cm sputtering electrodes. The LPH-30P uses direct current (DC) power to achieve a high target/substrate coverage rate. The LPH-30P is suitable for the deposition of oxides, nitrides and metals. The machine's other sputter source, the PES-30P, is a pulsed remote plasma source with a higher power level than the LPH-30P. It operates at a higher pressure setting and has a spiral shaped electrode. This design produces a higher-energy plasma and larger radius of sputtered material, resulting in faster deposition and improved uniformity in small areas. It is ideal for depositing alloys and other multicomponent materials. CFS-8EP-55 sputtering tool also offers users advanced process control capabilities. A controller connected to the chamber enables monitoring of all of the parameters in real-time. The controller is equipped with a Windows-based graphical user interface, providing an easy-to-use platform for controlling the asset's various functions. Additionally, the software allows for automatic process control to ensure the best possible film deposition results. Overall, SHIBAURA CFS-8EP-55 is a powerful and reliable sputtering model designed to meet the needs of today's research and development projects. The machine enables users to easily create high-quality thin films of a range of materials, giving them the ultimate in flexibility and control when processing sensitive substrates.