Used SHIBAURA ITO #9378267 for sale

SHIBAURA ITO is a sputtering equipment—an advanced technology used to create thin films of a variety of materials for scientific and industrial uses. It is frequently employed by laboratories in research and development initiatives because of the high quality materials it is capable of producing. At the core of the system is a DC magnetron sputter source, which uses an intense electric field to pass an electric current through a vacuum to a metallic target. This creates an plasma field that is powerful enough to shorten the distance between gas molecules and further form a gaseous or metallic film which subsequently deposits on underlying surfaces. The sputter-deposited films produced by ITO sputtering unit have numerous benefits, including improved physical and chemical stability, optical transparency, and hardness to name a few. SHIBAURA ITO machine utilizes a planar magnetron with a magnetic field generated by two similarly housed magnets, making it ideal for applications requiring a uniform deposition over large areas. In contrast to traditional circular magnetrons, the planar design allows for more control of the field's direction and more uniform film deposition even for complexly shaped surfaces. The tool is also highly efficient in terms of power consumption. With high power consumption efficiencies, ITO can operate on a small scale using lower power supplies than other sputtering systems. Additionally, the asset is designed with a low gas consumption rate, reducing the costs associated with constant and excessive gas replenishment. SHIBAURA ITO model is also ideal for applications that require compliance with stringent environmental regulations due to the equipment's low footprint. The system is designed to minimize the expulsion of particles into the environment, and is even equipped with a powerful filtration unit which ensures emissions are at the lowest levels, compliant with most environmental standards. Overall, ITO sputtering machine is a reliable, efficient and effective tool. Its DC magnetron sputter source is designed to generate films of superior quality, in addition to its ability to generate films over large areas with uniform control, making it an ideal choice for a variety of scientific, industrial and research projects. Its low power consumption and ability to meet stringent environmental regulations further widen the range of potential applications for this sputtering tool.