Used SHIBAURA MECHATRONICS CCS-2800 #293815200 for sale

SHIBAURA MECHATRONICS CCS-2800 is a cutting-edge sputtering equipment specifically designed for thin film deposition applications in various industries such as semiconductors, optics, and electronics. It incorporates advanced technology and precise control mechanisms to ensure efficient and reliable coating processes. At the core of CCS-2800 system is its sputtering chamber, which provides a controlled environment for the deposition of thin films onto substrates. The chamber is typically equipped with multiple sputter targets made of different materials, allowing for the deposition of a wide range of coatings with varying properties. These targets are bombarded with high-energy ions generated by a plasma source, causing material atoms to be ejected and deposited onto the substrate surface. One of the key features of SHIBAURA MECHATRONICS CCS-2800 is its advanced plasma generation unit, which is crucial for achieving high-quality thin film coatings. The machine utilizes high-power RF generators and magnetic field control to create a stable and uniform plasma discharge within the chamber. This plasma not only facilitates sputtering of the target materials but also helps in controlling the film composition, structure, and quality. CCS-2800 also incorporates a sophisticated gas handling tool that allows precise control over the gas composition and pressure inside the chamber. This is essential for creating specific film compositions and properties, as different gases can be introduced during the deposition process to modify the film characteristics. The asset is equipped with mass flow controllers and pressure gauges to ensure accurate and reproducible gas flow rates and pressures. In terms of substrate handling, SHIBAURA MECHATRONICS CCS-2800 offers a versatile configuration to accommodate various substrate sizes and shapes. The model can be equipped with a rotating substrate holder, allowing for uniform coating deposition on large-area substrates. Additionally, the chamber can be equipped with heating and cooling capabilities to control the substrate temperature during deposition, which is critical for optimizing film adhesion and morphology. CCS-2800 is controlled by a user-friendly interface that enables operators to set and monitor key process parameters such as deposition rate, target power, gas flow rates, and chamber pressure. The equipment also features advanced automation capabilities, allowing for recipe-based processing and remote monitoring and control. This not only enhances process repeatability and consistency but also increases overall productivity and efficiency. Overall, SHIBAURA MECHATRONICS CCS-2800 sputtering system represents a state-of-the-art solution for thin film deposition applications requiring high-performance coatings with precise control over film properties. Its advanced technology, reliable performance, and user-friendly operation make it a valuable tool for research and development as well as production environments in industries ranging from semiconductor manufacturing to optical coatings.