Used SHOWA SHINKU SIA 3000 #9192914 for sale

SHOWA SHINKU SIA 3000 is a state-of-the-art sputtering equipment widely used for the deposition of thin films by physical vapor deposition (PVD) and boasts high deposition rates. It is especially useful for the deposition of nitride or oxide films due to its wider operating range. The system includes a plasma rotation source, which allows for the deposition of films with uniform thickness and composition over a wide range of film thickness. It is equipped with an ion flux monitor, allowing for the control of deposition rates and a source power stabilizer for maintaining a consistent deposition rate. Additionally, the unit is capable of either DC or RF sputtering, depending on the type of film being deposited. SIA 3000 is designed to provide a precisely controlled environment for both substrate pre-cleaning and sputtering. The chamber is temperature-controlled to ensure optimal deposition conditions, and its integrated particle-removal machine ensures that the deposition environment is free of contamination. The tool operates with a rapid-transfer shutter, allowing for the rapid deposition of films on a variety of substrates, including metals, glasses, polymers, and alloys. Additionally, its magnetic shielding ensures uniformity and stability of the plasma even when operating at high pressures. In order to ensure that the film has uniform thickness and composition, the asset is equipped with a process control model that monitors and adjusts deposition parameters. The equipment also offers a choice of targets (refractory, alloy, ceramic, and composite), allowing for the flexibility to deposit a wide variety of film types. One of the biggest advantages of SHOWA SHINKU SIA 3000 is its easy-to-use operating system. It has a user-friendly graphical user interface that simplifies the setup process and makes it easy to program deposition parameters. Furthermore, its integrated tilt-and-rotate feature makes it easy to appropriately position the substrate in the chamber in order to achieve the desired deposition profile. Overall, SIA 3000 is an excellent choice for the deposition of thin films by physical vapor deposition. Its wide range of features, such as its heating unit, particle-removal machine, and process control tool, make it a reliable asset that can provide precise and consistent deposition of various film types.