Used SHOWA SHINKU SPH-2019F #9078362 for sale

SHOWA SHINKU SPH-2019F is a sputtering equipment designed for use in thin-film deposition applications. It is a cost-effective solution providing a high-quality deposition of metal or semiconductor films on large substrates such as solar cells or LCD displays. The sputtering system is equipped with a high-performance, direct-current/magnetron sputtering source capable of sputtering a wide range of materials including metals, alloys, dielectrics, and oxides. The source features an adjustable output power of up to 500 W with three different types of RF-power stabilization supply for superior film-deposition quality. The unit also contains a high-vacuum chamber equipped with a rodless linear-translation stage capable of moving the substrate up to 200 mm in diameter. The entire machine is capable of achieving an operating pressure below 6×10-3 Pa and a vacuum level of 6×10-6 Torr. In order to facilitate process control, the tool includes a process controller that enables up to 350 process parameters to be set and monitored. This controller features a Windows 7 operating asset, an intuitive graphical user interface, an in-built optical encoder, and a real-time monitor for rate of deposition. Furthermore, the model is also equipped with a programmable temperature controller for precise temperature control, while the equipment can also be modified to include additional modules and sensors as per the customer's requirement. SPH-2019F also offers an excellent uniformity of film deposition, with an average size of ±0.2 μm and deposition rate of up to 150 nm/minute. The system also offers excellent step coverage of 90-95% and films with a thickness of up to 200 nm are achievable with excellent quality. Overall, SHOWA SHINKU SPH-2019F provides a cost-effective, high-quality solution for thin-film deposition. With its versatile design, precise control capabilities, and high-performance sputtering source, it is an ideal choice for a wide variety of applications.