Used SKY TECH Nexda #293743695 for sale
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ID: 293743695
Wafer Size: 8"
PVD Sputtering system, 8"
(4) Process chambers: Ti, AlN, TiW, Turbo
Pulse DC Power supply
(4) Dry pumps
(2) Cryo pumps
Chiller
PC Rack.
SKY TECH Nexda is a cutting-edge sputtering equipment designed for precise and efficient thin film deposition in various research and industrial applications. This state-of-the-art system integrates advanced technologies to deliver superior performance, flexibility, and repeatability in thin film coating processes. At the heart of Nexda unit is its high-vacuum chamber, which provides a controlled environment for sputtering materials onto substrates with exceptional uniformity and purity. The chamber is equipped with multiple targets made of different materials, allowing for a wide range of material combinations and layer structures to be deposited on substrates. One of the key features of SKY TECH Nexda machine is its advanced target indexing tool, which enables rapid and automated switching between different targets without breaking vacuum. This feature not only enhances the efficiency of the thin film deposition process but also reduces downtime and improves overall productivity. The asset is equipped with a sophisticated power supply module that allows precise control of the sputtering process parameters, such as target power, substrate bias, and gas flow rates. This level of control ensures that the deposited thin films meet specific requirements in terms of thickness, composition, and structure, making Nexda model ideal for a wide range of research and industrial applications. In addition to its precise control capabilities, SKY TECH Nexda equipment features a comprehensive monitoring and diagnostics system that provides real-time feedback on key process parameters. This enables operators to monitor the thin film deposition process closely and make adjustments as needed to ensure consistent and high-quality film growth. The unit also incorporates a versatile substrate holder that can accommodate substrates of various sizes and shapes, allowing for flexibility in sample preparation and optimization of thin film properties. The substrate holder is designed to rotate and tilt, enabling uniform deposition of thin films on complex substrate geometries. To further enhance the performance of Nexda machine, it is equipped with a high-capacity pumping tool that ensures rapid and efficient evacuation of the chamber to achieve and maintain high vacuum levels required for sputtering processes. This pumping asset is essential for reducing contamination and improving the quality of deposited thin films. SKY TECH Nexda model is controlled by an intuitive and user-friendly software interface that allows operators to set up and monitor the sputtering process easily. The software interface offers a range of preset deposition recipes as well as the flexibility to create custom recipes based on specific requirements. In conclusion, Nexda sputtering equipment is a powerful and versatile tool for thin film deposition, offering advanced features, precise control, and flexibility for a wide range of research and industrial applications. Its superior performance, efficiency, and repeatability make it the system of choice for demanding thin film coating processes.
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