Used SPUTTERED FILMS INC / SFI Endeavor #9255519 for sale
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ID: 9255519
Sputtering system
Substrate heating: 100°C
Capable of 20 wafers
(3) Chambers:
Configured for multiple wafers, 4"
Chamber 1:
AC Sputtering of Si, SiN, SiO2, AlN, Al2O3 films
AlN rate: ~4.5 nm/min
Al2O3: ~6 nm/min
SiO2 rate: ~4.5 nm/min
Chamber 2:
DC Sputtering of Ti, TiN, TiO2, W and W-Oxides
Ti rate: ~200 nm/min
Chamber 3:
DC Sputtering of Al or Au, RF back sputtering with Argon
Al Dep rate ~300-400 nm/min.
Sputtering Films Inc (SFI) SPUTTERED FILMS INC / SFI Endeavor is a powerful and compact sputtering system designed for rapid thin-film deposition. With an integrated vertical design, SFI Endeavor is capable of providing a low-cost and efficient option for film deposition. Sputtering is a technique used in the semiconductor and other industries, allowing a thin layer of material to be deposited on a substrate. SPUTTERED FILMS INC Endeavor incorporates the latest in sputtering technology, providing high performance and precision deposition suitable for a variety of applications. With its single, integrated magnetron source, it is capable of sputtering a wide range of metals and other materials in a variety of shapes and sizes. An automated controller drives the rotation and movement of the substrate, providing better control over the deposition process. A heated sample chamber permits advanced temperature control and also allows the system to retain a consistent process environment. Endeavor is equipped with a variety of accessories to meet users' needs. It is compatible with a number of different substrate clamping techniques, as well as multiple sample holders. It can also accept a large number of optional chamber components for additional process versatility, such as sputtering, source rotation and adjustability, and supports both manual and automatic operations. In addition, SPUTTERED FILMS INC / SFI Endeavor is adaptable with several process gases, allowing for a variety of sputtering processes. SFI Endeavor also supports process automation, allowing users to quickly program their desired sputtering parameters to reduce variation between batches. In summary, SPUTTERED FILMS INC Endeavor Sputtering System from SPUTTERED FILMS INC is a powerful and versatile solution for thin-film deposition. It is capable of high-precision sputtering of a wide range of materials, and supports multiple process gases for additional flexibility. Its automated controller and heated sample chamber make it easy to set up and monitor deposition processes. With its multiple, custom configuration options, Endeavor can fit a variety of needs and provide a low-cost sputtering solution.
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