Used SPUTTERED FILMS INC / SFI Shamrock 5 #9315279 for sale

SFI (SPUTTERED FILMS INC) SPUTTERED FILMS INC / SFI Shamrock 5 is a physical vapor deposition (PVD) sputtering equipment designed for high-precision deposition of thin films. This system has been designed to meet the needs of production sputtering applications in a range of industries including flat panel displays, optoelectronics, energy storage, and thin film photovoltaic cells. SFI Shamrock 5 is a single-source, full-range sputter deposition unit that offers repeatable and consistent film deposition results. SPUTTERED FILMS INC Shamrock 5 utilizes an efficient In-Vacuum Magnetic Multipel Magnetron designed specifically for PVD applications. The Magnetron is capable of operating with up to four separate sputtering sources and has a superior uniform deposition characteristics. The vacuum chamber is designed to provide superior plasma uniformity and low particulate production. The sample stage has a load capacity of 50 kg and can rotate 360 degrees and tilt from 0 to 45 degrees manually or can be remotely controlled. The carrier gas delivery machine supplies oxygen or argon to the unit and is capable of a flow range from 0 to 500 cubic centimeters per minute. Shamrock 5 features a fully integrated process control tool that can control the entire PVD processes. This includes substrate temperature monitoring, adjustable process parameters, and real-time process monitoring. The asset includes an interface to a statistical process control (SPC) model to document process and quality control data. SPUTTERED FILMS INC / SFI Shamrock 5 can deposit most metals, alloys, ceramic materials, and organic materials. The equipment also supports mono and bi-layer deposition for special applications. The system can be operated manually or remotely and can be interfaced to a range of digital and analog devices. The unit also comes with a choice of software programs and instruments for data acquisition, analysis, and process control. Overall, SFI Shamrock 5 is an efficient, high-precision sputtering machine suitable for a wide range of deposition processes. The tool's advanced process control asset provides consistent and repeatable results. The model is simple to operate and provide users with the ability to remotely control process parameters and monitor results in real-time.