Used TAICHUNG SEIKI VVS-SS #293666752 for sale

TAICHUNG SEIKI VVS-SS (Vacuum Vapor Sputtering Equipment - Substrate Sputter System) is a versatile substrate sputter unit manufactured by TAICHUNG SEIKI Co., Ltd., a leading vacuum machine and equipment manufacturer. The sputtering tool is designed to deposit thin layers of various materials onto substrates for coating, film deposition and other related processes. The asset is ideal for applications that require precision and control over the coating thickness and composition. VVS-SS consists of multiple components required to create and control the sputtering atmosphere. The model consists of a vacuum chamber that can provide a clean, contamination-free environment, rotating target holders, and an efficient power supply equipment to provide the proper electrical energy and power. The system can also be integrated with a load lock chamber to allow automatic loading and unloading of the substrates. TAICHUNG SEIKI VVS-SS has an advanced and reliable power supply unit that can provide a stable voltage and current for the best results. Its advanced control panel allows for easy adjustment of all necessary parameters for accurate sputtering. In addition, the machine also features an advanced software control tool that can monitor and control the asset remotely. The model is capable of sputtering up to two substrates simultaneously and can process a wide range of materials, including metals, insulators, semi-conductors, and alloys. It also allows for thickness and uniformity control throughout the deposition process. Additionally, the equipment can provide vacuum levels down to 10- 6 torr for effective sputtering operation. VVS-SS is a versatile and efficient sputtering system that can be used for a wide range of applications, including thin film deposition, thin film linings, and oxide coatings. Additionally, it can be used for corrosion protection, deposition of anti-reflective coatings, and production of solar cells. The unit offers reliable and accurate control over the process, allowing users the utmost precision in the deposit thickness and composition. Furthermore, the machine is easy to use and maintain while providing an economic cost solution for substrate sputtering.