Used TEL / TOKYO ELECTRON Nexx Nimbus PVD #9212338 for sale

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ID: 9212338
Vintage: 2006
Sputtering system Missing parts: HX Dep chamber HX Loadlock cooling Cryo pump Dep bottom Cryo pump (Dep side) Robot arm (Bottom and top) Load lock assembly GENMARK Controller DC Generator (Dep) RF Generator (Etch) (5) Pentagon water hoses Ion-gauge (Dep) Ion-gauge (Etch) Pentagon motor Elevator motor Process robot motor Flow meter (Load lock) Flow meter (Pentagon) (4) ALCU Magnetrons Power: 120/208 V, 50/60 Hz, 3 Phase, 5 W, Maximum 150 Amps 2006 vintage.
TEL / TOKYO ELECTRON Nexx Nimbus PVD (Physical Vapor Deposition) is a sputtering equipment designed to target a variety of materials and uses. This state-of-the-art instruments feature high-precision technology, allowing for improvements in process capabilities. This sputtering system is engineered with TEMs (Thin Film Elecron-Multiplier unit). This machine allows for auto-correction of input data errors while maintaining accuracy of the plasma. This feature allows for enhanced process yields, resulting in better quality electrode products. The PVD also utilizes a unique high aspect ratio chamber design. This design offers optimal control of chamber atmosphere dynamics on the basis of enhancing uniformity in processes. The chamber design also facilitates faster sputtering times, allowing customers to maximize batch yields and throughput. TEL Nexx Nimbus PVD offers an extensive range of exchangeable multiple electrodes. This feature offers customers flexibility in electrode selection. These electrodes can be customized to meet their specific needs, allowing customers to optimize their specific processes for different materials. TOKYO ELECTRON Nexx Nimbus PVD also has a centralized operations control panel. This feature allows for easy viewing of operational status and allows for real-time diagnosis. This allows users to perform rapid diagnostics and troubleshooting, thus minimizing downtime and maximizing throughput. In addition, Nexx Nimbus PVD also features a full range of process options, including: oxidation, nitridation, ion implantation, etching, and diffusion. This versatility allows customers to easily adjust processes for optimal results. To sum up, TEL / TOKYO ELECTRON Nexx Nimbus PVD is a state-of-the-art sputtering tool, offering enhanced precision and control. This cutting-edge asset features unique chamber design, multiple exchangeable electrodes, and a range of process options. All these features allow for improved yield and production of quality products.
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