Used TEL / TOKYO ELECTRON / NEXX Nimbus 364 #9202788 for sale

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ID: 9202788
Wafer Size: 12"
Vintage: 2006
Sputtering system, 12" Nimbus XP-RDL system (354): 8"/12" Includes: MAGNETRON: G1 HP (Ti) MAGNETRON: G1 HP (W) MAGNETRON: G1 HP (Al) (3) MAGNETRONS : AL HP (Al) ICP Etch Second cryo pump: Deposition chamber RF Substrate bias Load lock degas (2) ESC Trays: 12" Additional cable length EMO State SECS/GEM 2006 vintage.
TEL / TOKYO ELECTRON / NEXX Nimbus 364 is a state-of-the-art sputtering system specially designed for semiconductor and photonic applications. It enables a high degree of process control and precision for the manufacturing of compound-semiconductor devices such as LEDs, solar cells, displays, and image sensors. TEL Nimbus 364's advanced DC and Hi-Bias RF sputter processes provide industry leading process capabilities. It utilizes Dynamic Process Control (DPC), an advanced sputtering technology that allows for fine adjustment of the quantity of deposition by controlling the power supply amplitude and negative bias pulse frequency. This type of process control capability ensures the production of superior materials with consistent repeatability of results. NEXX Nimbus 364 also features a dual frequency power supply, offering a high power level of up to 480W whilst also providing the flexibility of a two-frequency operation. This dual capability helps to reduce the incidence of arcing during deposition and therefore improves the overall precision of the process. Additionally, the 'Window' interlock safety feature helps to prevent damage to the substrate or parts in the event of any faults being detected during the process. The system's unique Load-lock allows for quick and easy loading and unloading of the substrate holder, ensuring rapid and efficient operations. The diamond-like carbon coating enhances the performance of the chamber and the substrate, providing improved precision and increased durability. The high temperature limit is set to 368.2°C, allowing for superior thermal capacity, whilst the convenient, ergonomic control panel provides for one touch control of the process. Nimbus 364 provides operators with a reliable and consistent sputtering process, designed specifically to meet the requirements of today's semiconductor application. With its advanced process control capabilities, superior material specifications, and enhanced durability, TOKYO ELECTRON Nimbus 364 system is an effective solution for meeting the evolving needs of the semiconductor industry.
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