Used TOKUDA CFS-4ES #9254477 for sale

TOKUDA CFS-4ES is a high-performance sputtering equipment which is designed for large-scale production of thin-film deposition. This product is tailored to meet the industrial needs of customers with its versatile features and advanced technology. The sputtering system is capable of performing four pneumatic sources simultaneously, which ensures a consistent process result and greatly increases production efficiency. The machine is equipped with a powerful 4-source DC magnetron sputtering power supply that can provide up to 2000 Watts of sputtering power for each source. This is combined with an automated control unit which allows for precise adjustment of pressure, ratio, deposition target geometry, and sputtering speed. CFS-4ES is made up of a number of components, such as an advanced chamber featuring an optically transparent quartz window and a scanning electron microscope to observe the sputtering process. Its vacuum chamber also has an integrated temperature measuring machine and a cryogenic tool to control the temperature of the substrates. Moreover, it also comes with a start and stop function which helps prevent contamination caused by deposition at lower temperatures. TOKUDA CFS-4ES also provides a wide range of deposition materials, including metals, oxides, nitrides, polymers, alloys, and more. This allows it to be used for a variety of applications such as dielectric materials, optical coatings, catalytic coatings, hardwear coatings, and energy storage devices. The asset supports a wide range of processes and substrate sizes from 25mm to 300mm in diameter, and features a floating substrate holder that ensures optimum contact between the substrate and sputtering target. Furthermore, the machine is easy to operate and comes with a user-friendly control software that allows users to easily monitor and calibrate the process. In addition, CFS-4ES includes an after-treatment model, ensuring that the substrates are adequately treated before being released from the sputtering process. This helps ensure the quality of the substrate is not compromised during the process, and allows for uniform deposition of materials. In summary, TOKUDA CFS-4ES sputtering equipment is an advanced sputtering system that can be used for the production of thin-film deposition. It is capable of supporting a wide range of materials and processes, and its user-friendly control software makes it easy to operate and monitor. Additionally, its after-treatment unit ensures the quality of the substrate is not compromised during the process.