Used TOUSIMIS Samsputter IIA #126410 for sale

TOUSIMIS Samsputter IIA is a PVD (Physical Vapor Deposition) sputtering equipment that is widely used in the production of thin-film coatings for a variety of industrial and scientific applications. Samsputter IIA is deployed in conjunction with a wide range of PVD processes such as DC, Pulse DC and RF sputtering to deposit a variety of materials onto a substrate. It is designed to be used in combination with a wide range of plasma etching processes to produce a variety of advanced materials. TOUSIMIS Samsputter IIA is capable of generating deposition rates in excess of 0.8 μm/min with precise control over the thickness and quality of the coating. It features a low-vacuum design that is capable of sustaining evacuation levels of up to 0.5 Pa without degrading the quality of the thin film deposition. The advanced design also allows for excellent uniformity and consistency in the coating thickness across the entire substrate. The system is equipped with an advanced electronics package that includes an embedded Arduino-based processing unit and an intuitive graphical user interface (GUI). This allows for accurate programming and control of the deposition rate, target pressure, deposition temperature and other parameters. The built-in sensors also provide feedback regarding the quality of the deposited film. In order to ensure consistent, repeatable results, Samsputter IIA is equipped with advanced safety features such as a high power shutdown switch and filter integrity monitoring. Additionally, due to its modular design, it is easy to integrate with existing PVD processes and systems. Furthermore, TOUSIMIS Samsputter IIA is also designed to accommodate a variety of substrates and films. Reinforced graphite substrates, ceramic films and oxide films are just a few of the materials that can be deposited using this machine. Overall, Samsputter IIA is an advanced, high-quality sputtering tool that can be used in a wide range of industries and scientific applications. It is easy to use and configure, and its advanced features make it an ideal choice for producing thin-film coatings.