Used TOUSIMIS Samsputter IIA #141766 for sale

TOUSIMIS Samsputter IIA is a versatile sputtering equipment designed for diverse thin-film deposition needs. The system combines two sputter guns in which a range of materials can be sputtered while directed ion beams refine the shape of the film. This allows for precise control over the thickness and composition of the film being deposited. Samsputter IIA has a wide range of process parameters that can be adjusted. It has a working temperature range of between 25°C and 75°C, with a process time for films of 0.1 to 15 seconds. The ion source can be operated on either DC or RF powers ranging from 30 to 1000 watts, providing flexibility to accommodate diverse deposition processes. The two sputter guns are equipped with a variety of targets that can accommodate a range of deposition qualities and substrates such as aluminum, chromium, silicon, and titanium. TOUSIMIS Samsputter IIA is also equipped with a lower chamber that allows for process gases such as nitrogen, argon, and methane to be used in the deposition process. This helps to improve the stability of the film and can be used for reactive sputtering processes. Samsputter IIA has a variety of parameters that can be indicated via pressure gauges and monitors, allowing for precise control of the deposition process. It also has a cooled down-dip controller with a range of variable temperature settings that can be adjusted to optimize the deposition conditions. In addition to its user-friendly control panel, a variety of safety features are built into TOUSIMIS Samsputter IIA. It is equipped with emergency stop buttons, power failure protection, and an ion source monitoring unit that alerts the operator if the machine is functioning outside of pre-set parameters. Samsputter IIA is easy to operate, reliable, and able to meet a variety of thin-film deposition needs. Its robust construction and high-performance features make it a great choice for those in need of a reliable sputtering tool.