Used ULVAC Ceraus Z-1000 #9053697 for sale

ULVAC Ceraus Z-1000 is a sputtering equipment designed for thin-film deposition processes. Typically used in research and production environments, the system uses magnetron sputtering technology to deposit thin films of metal or other materials on substrates. This technology is ideal for creating thin layers of aluminum, molybdenum, tantalum, titanium, chromium, cobalt, platinum, iridium, and tungsten, with coating thicknesses ranging from 10nm to 1000nm. Ceraus Z-1000 unit is equipped with a sputtering chamber that offers a generous working space and a bell jar sealable machine that provides a high level of contamination control. It employs an open chamber design for easy substrate loading and a close-loop cooling water tool that ensures process temperature stability. It is also outfitted with a rigorously engineered internal gas control asset to reliably monitor and regulate pressure. The model utilizes two cathodes installed in the sputtering chamber, each with a number of magnetron coils. The cathodes are connected to RF and DC power sources that allow for the independent control of positive and negative ions in the chamber. This allows for the selective deposition of different sputtering materials and the combination of materials to form 2-layer to 5-layer films. The equipment can also create tandem and multilayer structures. On the vacuum side, the system operates in the range of 1x10-4 to 1x10-6Pa with a main pumping unit, a turbomolecular pump, a retention plate pipe and forepump option. On the external side, the advanced automation interface provides easy control, monitoring, and operation from a distance. The machine also offers data and software controls for process parameters such as preferred coating thickness, dwell time, pump speed, pump time, and floating voltage. ULVAC Ceraus Z-1000 is a medium-vacuum sputter tool with an integrated chamber design. It features high deposition rates, precise process control, and high-quality thin-film deposition. It's ideal for research and production of high-precision thin films with strict requirements for film composition, film performance, and substrate sizes.