Used ULVAC Ceraus Z-1000 #9083925 for sale

ULVAC Ceraus Z-1000 is an advanced sputtering equipment designed for thin-film deposition. It is a compact, high-performance system featuring a new sputtering source design that allows for high sputtering rates, improved deposition uniformity, and higher rate throughput. The sputtering source uses an advanced direct current (DC) magnetron sputtering technology which provides high deposition rates with good uniformity and film profiles. Additionally, the unit has been designed with sophisticated temperature and pressure controls, which provide excellent process control and reproducibility. Ceraus Z-1000 features a powerful computer-aligned control machine with automatic control of sputtering parameters such as voltage, pressure, gas flows, and substrate temperature. This ensures optimal deposition of a wide variety of different thin-film materials. The tool includes a T/E Sapphire FE High Temperature Reactor (HTR) with 5 zone heating capability, a High Power Density DC Electron Cyclotron Resonance (ECR) source with 12 kW power, and a fully integrated normal and high vacuum pumping unit. ULVAC Ceraus Z-1000 asset is ideal for many thin-film applications. It can be used for the deposition of metal, semiconductor, dielectric, and organic/photoresist films. It supports up to four samples, which can be loaded simultaneously in either a square or round configuration. With its fast-sputtering rate of up to 107 angström/s, the model can produce high quality thin films quickly and efficiently. Moreover, Ceraus Z-1000 features advanced diagnostic capabilities, including in situ X-ray analysis and optical and electron microscopic techniques. The equipment also includes integrated AutoTuneTM software, which allows for simplified optimization of the sputtering process. The system enables simple and intuitive control of all process parameters, ensuring reproducibility and repeatability of the deposition process. ULVAC Ceraus Z-1000 is an ideal tool for thin-film deposition procedures. It has a compact design and a powerful computer-aligned control unit that provides excellent process control and reproducibility. With its high sputtering rate, high-power electron cyclotron resonance (ECR) source, and in situ diagnostic capabilities, Ceraus Z-1000 provides great flexibility to meet the needs of any thin-film deposition project.