Used ULVAC Ceraus Z-1000 #9156845 for sale

ULVAC Ceraus Z-1000 is a versatile sputtering equipment for etching and depositing thin film materials. The Z-1000 is equipped with a variety of components and features which allow for a wide range of materials and processes to be implemented. It provides high-rate uniformity, with a repeatability of ±2%, and outstanding layer uniformity with relative variance of <2%. The system is widely used in the semiconductor and optoelectronic industries for the deposition of oxides, nitrides, conducting metal films, and metals such as copper, gold, and aluminum alloys on substrates. The sputtering unit utilizes piece-by-piece DC etching to obtain high-definition films with uniform area coverage. It features a low-temperature sputtering process and allows for highly precise control of the deposition rate and uniformity. The Z-1000 also has an high-vacuum essential for optimal sputtering, and includes an ion power source to provide precise control over the bombardment of particles with the substrate. The Z-1000 is capable of depositing metals, alloys, and oxides, and can process a variety of substrate materials including silicon, quartz, quartz-lined glass, and more. It allows for an adjustable pressure range of 1 x 10-5 to 8 x 10-1 hPa, and can provide a maximum substrate bias of 10-200V dc. The machine features 9 inch to 12 inch wafer orientations, allowing for a variety of wafer sizes to be used. It also features temperature control between 2 °C and 130°C, and a sputter power range of 50-550 W. Ceraus Z-1000 has 360mm of working distance for simultaneous loading and unloading of substrates, and comes with an Oerlikon Leybold dry pump that can reach maximum vacuum levels of <4x10-7 Pa. In addition, the tool comes with an Auto Wafer Loader and Load Lock, providing simplified and automated loading and unloading of substrates. The integrated Windows-based software can monitor and record all data related to processing and help to optimize necessary parameters, such as substrate temperature, sputter power, rotational speed, and more. The software also allows customers to set up and store multiple processing conditions for later use. Overall, ULVAC Ceraus Z-1000 sputtering asset is designed for the etching and deposition of thin films on substrates and is versatile enough to manage a variety of materials and processes. Its advanced features, including low-temperature processing, adjustable vacuum levels, and automated substrate loading, make the Z-1000 an ideal choice for sputter deposition and etching of oxides, metals, and alloys.