Used ULVAC Ceraus Z-1000 #9198269 for sale

ULVAC Ceraus Z-1000 is a state-of-the-art sputtering equipment. The sputtering system consists of a chamber, a sputter source, a vacuum unit, a gas feed machine, and a treatment control unit. The tool is designed to deposit a thin film of desired material on a substrate. The sputter chamber is a cylindrical chamber with a central flange plate. The chamber is made of stainless steel and is pressure-resistant up to 10 torr. It has a 12-inch-diameter viewing window and two 4-inch ports for flange connections. The chamber is equipped with an automated door asset, which allows for easy access and rapid loading and unloading of the substrates. The sputter source is a diode-type sputter gun with an ED gun port and a Mo gun port. It generates a high-density plasma produced from Argon gas, which is used to sputter the surface of a substrate. The sputter gun is connected to a power supply, which is designed to provide variable power control. The sputtering process is also controlled through the treatment control unit. The vacuum model consists of a rotary pump, a turbomolecular pump, and a combination baffle-and-trap assembly. The pumps are designed to provide a clean, dry vacuum environment within the chamber. The combination baffle-and-trap assembly is used to remove pollutants and debris that may be produced during the sputtering process. The gas feed equipment is designed to introduce Argon gas into the chamber during the sputtering process. It is connected to both the sputter gun and the vacuum system. The gas feed unit is equipped with sophisticated pressure sensors, which are used to monitor the pressure within the chamber. This ensures that the pressure remains at the optimal level for the sputtering process. The treatment control unit is used to monitor and control all of the processes involved in the sputtering process. It is equipped with advanced safety features, such as temperature and pressure controllers. It also has the ability to display various information about the process, such as the pressure and temperature within the chamber. Ceraus Z-1000 is an advanced sputtering machine that is used for the deposition of thin films on substrates. It is a reliable and versatile tool that provides precise control of the process parameters and is suitable for a variety of sputtering applications.