Used ULVAC Ceraus Z-1000 #9400323 for sale

ULVAC Ceraus Z-1000 is a sputtering equipment that is designed to deposit films of metals and insulators on a range of substrates at precisely controlled thicknesses. The system consists of an ion source, a chamber and an array of hydrocarbon-free pumping ports. The ion source is powered by a RF generator and supplies a high density of ions for uniform sputtering. The chamber is made of aluminum or stainless steel and is temperature-controlled to within ±2°C. There is an array of water-cooled targets mounted on a target driver and the targets are pre-coated with a form of ConAg solution to prevent outgassing and minimize contamination. The Z-1000 employs a unipolar magnetron sputtering process with a powerful magnetic field from a permanent magnet that ensures a uniform deposition of thin films over the entire wafer. The components within the chamber are isolated from each other to ensure there is no interference between the ion source and the deposition process. The adjustable configuration of the gas inlet, external gas sources and the gas mass spectrometer allow for precise control of the process parameters such as pressure and gas flow. The Z-1000 also has an in-situ monitoring unit that provides a real-time analysis of the deposition process. This machine records the profile of the film, the deposition rate and other data. There is a post-deposition analysis of the film characteristics against the expected results without having to stop the process. Ceraus Z-1000 is a highly precise sputter tool that employs advanced plasma technologies to achieve uniform thin-film depositions. It provides accurate control of the process parameters and provides in-situ monitoring for precise control over the deposition process. The asset is suitable for a range of metals and insulators on a variety of substrates. The Z-1000 is an efficient tool for research and device applications.