Used ULVAC Ceraus Z-1101 #293625450 for sale

ULVAC Ceraus Z-1101
ID: 293625450
Wafer Size: 8"
Sputtering system, 8" TMP Turbo pump missing.
ULVAC Ceraus Z-1101 is a sputtering equipment capable of providing high-precision, high-reliability results in multiple industrial and research applications. This system features a powerful sputtering chamber, with a built-in sputtering source and an 11"x11" working area. It is capable of depositing various nanoparticles on various substrates, such as glass, plastics, and metals. Its chamber is built for pure and austenitic stainless steel and is thermally separated from the sputtering source. This ensures high-precision results and prevents thermal desorption of the samples. Ceraus Z-1101 utilizes an RF-based sputtering source to deposit material onto a substrates. The source is offered in powers up to 3 kW and can be programmed to obtain various thicknesses of the deposited film. It puts out a high-intensity plasma discharge with a wide range of plasma-generating gases and gases mixtures, such as Ar, O2, O+N2, and CO+Ar. Furthermore, the unit is equipped with a three-electrode machine, ensuring that the substrate and sputtering source can be operated independently and controlled precisely. These features allow for a wide range of processes and applications, as the tool can depose materials of varying thickness and composition. ULVAC Ceraus Z-1101 also features a process chamber with a feed-through housing, allowing for in-vacuum sample loading and unloading. Additionally, a shutter may be ordered for the asset to prevent contamination, and the chamber is capable of operation under atmospheres of up to 40 mbars of vacuum. Furthermore, all process parameters and activities are monitored by the set-up control software, ensuring reliable, repeatable and consistent results. Overall, Ceraus Z-1101 is a powerful, high-precision sputtering model highly suitable for a multitude of industrial and research applications, ranging from automotive and medical device coating to nanocluster deposition for lab-on-a-chip devices. The variety of configurations available allow for flexible, user-defined requirements to be met, and its reliable, repeatable results make it an ideal choice for the most demanding of projects.
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