Used ULVAC CERAUS ZI 1000 #9378914 for sale
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ID: 9378914
Wafer Size: 8"
Vintage: 1998
Sputtering system, 8"
CIM: SEMI Auto to CTC
Sputter Zi (LTS with sputter etcher)
PF
(6) Chambers
Transfer, LLA And LLB Chamber
P1 - ICP Etcher
P2 - Degas
P3 - ICP Etcher
P4 - LTS (Ti/TiN)
P5 - LTS (Ti/TiN)
P6 - LTS (Ti/TiN)
Loadlocks:
LLA VCE4, (30) Metal stocker slots
LLB VCE4, (30) Metal stocker slots
Hardware configuration:
Chamber 1: ICP
Chamber 2: Degas
Chamber 3: ICP
Chamber 4: LTS
Chamber 5: LTS
Chamber 6: LTS
In-aligner
In-cooler
Mainframe: BROOKS M800
Wafer mapping: Standard
Transfer MAG 7.1 Robot
Transfer armset MAG 6
3-Axis Bi-symmetric dual frogleg
ULVAC C30ZR Helium compressor
RISSHI CS-1700H Chiller
Handler System
Cables
Metal cover
Power supply rack
Computer with rack
Pump
Front panel
Raise platform & accessories
Process:
Chamber 1: Etch
Chamber 2: Degas
Chamber 3: Etch
Chamber 4: Ti/TiN dep
Chamber 5: Ti/TiN dep
Chamber 6: Ti/TiN dep
Wafer notch alignment
Cooler
Generators:
Chamber 1: DC 1, DC 2, ULVAC RFS05C, RF, AC Bias
Chamber 2: DC 1, DC 2, RF, AC Bias
Chamber 3: DC 1, DC 2, RF ULVAC RFS05C, AC Bias
Chamber 4: DC 1 KYOSAN, DC 2, RF, AC Bias, HPK15Zi
Chamber 5: DC 1 KYOSAN, DC 2, RF, AC Bias, HPK15Zi
Chamber 6: DC 1 KYOSAN, DC 2, RF, AC Bias, HPK15Zi
Turbo pumps:
SHIMADZU 303LM
SHIMADZU 303LM
SHIMADZU 403LM
SHIMADZU 1003LM
SHIMADZU 1003LM
SHIMADZU 1003LM
SHIMADZU 1003LM
SHIMADZU 1003LM
1998 vintage.
ULVAC CERAUS ZI 1000 is a sputtering equipment made by ULVAC (Ultra-Low Vacuum Apparatus Corporation), a leading high-tech manufacturer of vacuum coating equipment. This system uses a ceramic target and an ionized inert gas such as Ar or He to coat a wide variety of materials with a layer of desired material. The target is placed in a vacuum chamber, and ions are accelerated toward the target by a powerful modulated voltage source. The collision of the accelerated ions with the target creates an atmosphere of nano-sized particles, allowing the coating material to adhere to the observed substrate in a precise manner. ULVAC CERAUS ZI-1000 offers unique performance features that make it stand out from other sputtering systems. Its advanced temperature control unit allows for precise temperature control and stable operations, even during prolonged operations. This helps to ensure that the coating is consistent throughout the process. It also features a pre-ignition machine, which reduces start-up times and improves efficiency. The tool is designed to provide uniform deposition of the coating material, with high uniformity and excellent particle density across the entire substrate. CERAUS ZI 1000 has an integrated vacuum asset, which allows for low pressure deposition. This model has a maximum vacuum of 1 x 10-3 Torr, which enables the coating material to travel in a more efficient straight line towards the substrate, allowing greater control over the coating thickness. It also features water and safety interlocks and a laser obstructs to ensure safety. CERAUS ZI-1000 is capable of providing excellent results in all types of reactive sputtering and thermal evaporation applications. It is ideal for achieving precise coatings on a wide variety of substrates, from polymers to highly sensitive semiconductors. It is renowned for its reliable manufacture and superior performance, making it perfect for a wide range of industrial applications.
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