Used ULVAC Ceraus Zi-1000N #9053702 for sale

ULVAC Ceraus Zi-1000N is a single chamber sputtering equipment designed for high throughput sputtering applications. This sputtering system is optimized for uniform films, thicknesses, higher rates and improved yields. Its revolutionary advanced design provides superior productivity and lower cost of ownership. Ceraus Zi-1000N utilizes ULVAC unique peripheral sputtering chamber unit to achieve high throughput sputtering. This chamber machine uses large DC and pulsed-DC (PDC) magnetrons on each side of the process chamber, and ionizing electrons can be injected onto the cathode to improve sputtering rate. The peripheral sputtering chambers generate a large sputtering area, allowing the tool to perform highly uniform sputtering processes. ULVAC Ceraus Zi-1000N also features optional ion-beam assisted deposition (IBAD) capabilities, allowing for optimized film characteristics. The IBAD chamber is retrofitted to the existing production chamber, and powerful ionbeam sources can be utilized to beam particle species such as argon and xenon onto the sputtered films for improved microstructure and film hardness. Ceraus Zi-1000N is maintenance-friendly, featuring a sealed and flexible environment that prevents dust from entering the production chamber. The asset also has automatic pressure control, making it easy to operate and maintain. The programmable logic control (PLC) model and wafer handling robots also minimize downtime, allowing the equipment to be operated with minimal interruption. Overall, ULVAC Ceraus Zi-1000N is a powerful and versatile sputtering system suitable for a variety of applications. Its high throughput, uniform films, improved yield, advanced PLC unit and IBAD capabilities make it an ideal choice for those looking for a reliable sputtering machine.