Used ULVAC Ceraus ZX-1000 #9102244 for sale

ULVAC Ceraus ZX-1000 is a sputtering equipment capable of producing a range of films. It is well suited for those requiring a wide variety of thin film deposition processes and materials. The sputtering process itself works by bombarding a target material with a gas such as argon. When this occurs, the target material is eroded by the gas and its depositing onto a substrate. ULVAC CERAUS ZX 1000 system is designed with this in mind and is able to provide high uniformity during the deposition of the target material. The main feature of the unit is that it includes a range of chamber sizes and shapes. This allows the user to configure the machine to their specific needs. The chamber is roughly shaped like an inverted cone, enabling the deposition to be uniform across the substrate [11]. The target holder is resistant to heat and allows the target material to be securely held in place while the workers deposit it on the substrate. One of the key features of Ceraus ZX-1000 that sets it apart from the competition is its wide operating range. It can operate in temperatures ranging from -10°C to 450°C which makes it suitable for a range of applications. It also has a low particle count, particularly due to its gas cleaning tool, meaning that any contaminants are removed before the material is deposited on the substrate. CERAUS ZX 1000 is also capable of controlling parameters such as pressure and RF power. This allows the user to fine tune the film structure and thickness. It also includes a range of controllers and safety mechanisms which are designed to protect the asset from any possible errors. These include automatic temperature control, mass flow control and a number of interlock systems which enhance safety during operation. ULVAC Ceraus ZX-1000 is a versatile and reliable sputtering model that is suitable for a range of applications. It provides users with a range of chamber sizes and shapes, as well as the ability to control various parameters to ensure optimal conditions for film deposition. Its wide operating range and low particle count further add to its appeal, making it ideal for producing high quality thin films.