Used ULVAC Ceraus ZX-1000 #9156841 for sale

ULVAC Ceraus ZX-1000 is an advanced sputtering equipment, designed for use in demanding, high-throughput research and manufacturing operations. It is capable of producing robust thin-film coatings, while providing the ultimate in process flexibility, accurate and uniform deposition, and process stability. The system has a six-sputter source to reduce sputtering time and maximize productivity. The sources can be easily configured for single target or dual target multi-layer deposition. An integrated load-lock provides a closed chamber environment for load and unload. It is controlled by a touch-screen panel with intuitive user interface and a high-end PC for data gathering and recording. The unit offers a variety of advanced sputtering techniques, including magnetron sputtering, dual magnetron sputtering, ion beam sputtering, and reactive ion beam sputtering. This allows users to achieve outstanding coating quality and film thickness control. The machine also features DC direct, AC pulse, and four wave modulated power supplies for optimal deposition control and uniformity in sputter rate. The tool has two independent gas delivery systems, with dynamic and static plasma conditions, to provide precisely controlled sputter and etch processes. The gases can be combined with sputtered particles during film deposition to create desired film properties. It also features a fully automated online process to monitor and control the film deposition in real-time. The asset also has an optional high vacuum load lock chamber for high deposition rates and optimal results on high-temperature or oxide processes. In addition, the optional Auto-Improvement function helps users optimize their process parameters and film compositions for best results by providing feedback based on in-situ process signals. ULVAC CERAUS ZX 1000 provides reliable and reliable sputter model for demanding research and production applications. It has excellent performance in terms of uniform and accurate deposition control, process flexibility, and process stability. Its advanced process control capability and user-friendly interface make it an ideal choice for demanding industrial applications.